Fabrication of carbon/silicon carbide composites by isothermal chemical vapor infiltration, using the in situ whisker-growing and matrix-filling process

Citation
Bj. Oh et al., Fabrication of carbon/silicon carbide composites by isothermal chemical vapor infiltration, using the in situ whisker-growing and matrix-filling process, J AM CERAM, 84(1), 2001, pp. 245-247
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF THE AMERICAN CERAMIC SOCIETY
ISSN journal
00027820 → ACNP
Volume
84
Issue
1
Year of publication
2001
Pages
245 - 247
Database
ISI
SICI code
0002-7820(200101)84:1<245:FOCCCB>2.0.ZU;2-A
Abstract
C/SiC composites,were prepared via isothermal chemical vapor infiltration ( ICVI), A novel process of ill situ whisker growing and matrix filling durin g ICVI was devised to reduce the porosity of the C/SiC composites, by alter nating the dilute-gas species. C/SiC composites with increased density were prepared successfully using this novel process, in comparison with those o btained from the conventional ICVI process. The whiskers seem to have grown into the large pores and modified the pore structure that is filled by the SIC matrix.