Selective deposition of ZnF(OH) on self-assembled monolayers in Zn-NH4F aqueous solutions for micropatterning of zinc oxide

Citation
N. Saito et al., Selective deposition of ZnF(OH) on self-assembled monolayers in Zn-NH4F aqueous solutions for micropatterning of zinc oxide, LANGMUIR, 17(5), 2001, pp. 1461-1469
Citations number
24
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
LANGMUIR
ISSN journal
07437463 → ACNP
Volume
17
Issue
5
Year of publication
2001
Pages
1461 - 1469
Database
ISI
SICI code
0743-7463(20010306)17:5<1461:SDOZOS>2.0.ZU;2-V
Abstract
The deposition manner of ZnF(OH) on the OH- and phenyl-terminated self-asse mbled monolayers (SAMs) in Zn-NH4F aqueous solutions has been investigated. NH4F plays a role as a control agent of supersaturation by complex formati on in the deposition process of ZnF(OH). ZnF(OH) was deposited as spherical particles on a substrate and decomposed into ZnO by annealing at 300 degre esC in air. A shorter induction time for heterogeneous nucleation and a lar ger number density of nuclei of ZnF(OH) were found on the OH-SAM surface, w hich indicates a lower interfacial energy between ZnF(OH) and the OH-SAM su rface. Taking advantage of the effects of the surface functional groups on the deposition manner, ZnO was successfully micropatterned by using photopa tterned SAMs as templates.