A sample preparation method has been developed whereby sharp needle-shaped
specimens for atom probe analysis are fabricated from multilayer thin films
deposited onto silicon substrates. The specimens are fabricated in an orie
ntation such that atom probe composition profiles across the layer interfac
es can be determined with atomic-layer spatial resolution, i.e., the layer
normals are parallel to the needle axis. The method uses standard silicon e
tching techniques and focused ion-beam milling. The feasibility and utility
of this technique are shown through its application to a NiFe/CoFe/Cu/CoFe
-based thin film structure.