The thickness evolution of the second-order nonlinear layer in thermally poled fused silica

Citation
M. Qiu et al., The thickness evolution of the second-order nonlinear layer in thermally poled fused silica, OPT COMMUN, 189(1-3), 2001, pp. 161-166
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
OPTICS COMMUNICATIONS
ISSN journal
00304018 → ACNP
Volume
189
Issue
1-3
Year of publication
2001
Pages
161 - 166
Database
ISI
SICI code
0030-4018(20010301)189:1-3<161:TTEOTS>2.0.ZU;2-I
Abstract
Systematic investigation oil the second-order nonlinearity in thermally pol ed fused silica is reported. The method of the thickness measurement is by fitting the Maker fringe. It is found that the thickness of the second-orde r nonlinear layer depends on all the poling parameters, not only the poling time, but also the poling temperature and the poling voltage. The thicknes s of the second-order nonlinear layer increases linearly with the poling ti me and the poling voltage. The thickness of the second-order nonlinear laye r depended on the poling temperature in a function of an Arrhenius plot. A discussion is given on the mechanism of the above evolution. (C) 2001 Publi shed by Elsevier Science B.V.