This research concerns the development of a SF6 RF discharge at low pressur
e in a small reactor for industrial applications. The plasma is produced in
the pressure range 0.05-1 mbar by a RF supply. The pumping system sustains
a flowrate of about 50 cm s(-1), with residence time in the discharge of a
bout 0.2 s at a pressure of 0.1 mbar. The discharge parameters were measure
d at a low operation power. Measurements were performed by means of movable
electrostatic probes and a photodiode. Particular care in the analysis of
the data proved to be necessary due to the presence of a substantial amount
of negative ions. The reactor has been employed for textile treatment in o
rder to modify the surface properties of the fibres. Favourable operating c
onditions leading to an improved hydrophobicity of the textiles were achiev
ed.