High-temperature chemical vapor deposition. An effective tool for the production of coatings

Chemical vapor deposition (CVD) processes have a large throwing power and c an operate at atmospheric pressure. Therefore, they are economical for many applications. High-temperature CVD processes give a good control of the cr ystal structure (e.g., epitaxial layers or other special layer structures) and support diffusion processes. The are used, for example, for the followi ng deposition processes: 1) perovskites, 2) yttrium-stabilized ZrO2 layers as ion conductors or heat barrier coatings, 3) aluminide diffusion coatings in long tubes for corrosion protection, and 4) BN on fibers for fiber-rein forced materials. The special properties of the perovskite CVD are discusse d in more detail. These processes are described for small- and large-scale applications. The CVD process is simulated by the computer code Fluent.