Characterization of magnesium fluoride thin films produced by argon ion beam-assisted deposition

Magnesium fluoride thin films have been deposited on silica glass and singl e crystal silicon substrates by argon ion beam-assisted deposition (IBAD). The structure, composition, mass density of films deposited at ambient temp erature were investigated as functions of the flux and kinetic energy of ar gon ions striking the film surface. The residual stresses in the films calc ulated from the change of the radius of curvature of silicon substrates, we re studied as functions of the normalized momentum (P-N) transferred from i ncident argon ions to deposited atoms. The respective contributions of ther mal, intrinsic and extrinsic stresses in residual stresses were also determ ined. Thin films produced with a P-N value of approximately 55 g(1/2) mol(- 1/2) eV(1/2) exhibited appropriate characteristics for optical applications . (C) 2001 Elsevier Science B.V. All rights reserved.