Electrical transport studies in nanocrystalline CdSe/SiO2 composite films

Citation
Sk. Bera et al., Electrical transport studies in nanocrystalline CdSe/SiO2 composite films, THIN SOL FI, 382(1-2), 2001, pp. 86-94
Citations number
30
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
382
Issue
1-2
Year of publication
2001
Pages
86 - 94
Database
ISI
SICI code
0040-6090(20010201)382:1-2<86:ETSINC>2.0.ZU;2-S
Abstract
SiO2/CdSe/SiO2 composite films in nanocrystalline form were deposited on qu artz substrates at similar to 20 Pa with deposition temperatures ranging fr om 220 to 240 K using a multi-target magnetron sputtering system. Optical, electrical, and microstructural (TEM and AFM) studies were carried out on t he composite films. Studies of the variation of conductivity with temperatu re indicated Efros hopping within the Coulomb gap to be the predominant car rier transport process in the composite films. Furthermore, a crossover fro m a 'soft' to a 'hard' Coulomb gap was noticed with lowering of temperature . (C) 2001 Elsevier Science B.V. All rights reserved.