Selective deposition and micropatterning of titanium dioxide thin film on self-assembled monolayers

We succeeded in fabricating micropatterns of titanium dioxide thin films on SAMs (self-assembled monolayers). SAMs of OTS (octadecyltrichloro-silane) were formed on Si wafers, and were modified by UV irradiation using a photo mask to generate methyl/silanol-pattem. They were used as templates to depo sit titanium dioxide thin films by the use of TDD (titanium dichloride diet hoxide). Amorphous films with approximate compositions Ti/O/CI/C = 1:2.2:0. 17:0.37 were selectively deposited on silanol regions. Line width variation of the pattern of an as-deposited film was improved to be well below the e lectronics design rule, 5%. Annealing the films at high temperatures (400-6 00 degreesC) gave rise to an anatase phase, while the resolution of a micro pattern remained unchanged. (C) 2001 Elsevier Science B.V. All rights reser ved.