Subthreshold characteristics of submicrometer polysilicon thin film transistor

Citation
Dn. Yaung et al., Subthreshold characteristics of submicrometer polysilicon thin film transistor, THIN SOL FI, 382(1-2), 2001, pp. 271-274
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
382
Issue
1-2
Year of publication
2001
Pages
271 - 274
Database
ISI
SICI code
0040-6090(20010201)382:1-2<271:SCOSPT>2.0.ZU;2-Q
Abstract
The subthreshold characteristics of both hydrogenated and unhydrogenated su b-micrometer polysilicon thin-film transistors have been investigated in de tail, The subthreshold slope of unhydrogenated TFTs becomes steeper at high er drain voltage. This is attributed to the floating-body effect that resul ts from the positive feedback between transistor current and impact ionizat ion current. The floating-body effect of poly-TFTs was found to relate to g rain size, drain voltage and hydrogenation. For the TFTs with larger poly-g rain, the floating-body effect was more obvious and appeared at lower drain bias. After hydrogenation, the floating-body effect was suppressed. Theref ore, the subthreshold swing of hydrogenated TFTs is continuously increasing with drain voltage. (C) 2001 Elsevier Science B.V. All rights reserved.