The initial stages of formation of an Yb-Si(111) interface are investi
gated by several methods: thermal desorption spectroscopy, atomic beam
modulation, and low-energy electron diffraction. The structure of the
adsorbed films and ytterbium silicide films is analyzed over a wide r
ange of surface coverage ratios, along with the desorption kinetics of
Yb atoms. The desorption activation energies of Yb atoms are measured
for 3x2, 5X1, and 2X1 submonolayer structures, The temperature interv
al in which ytterbium silicide decomposes and the activation energy of
this process are determined, It is shown that the Yb-Si(111) phase in
terface evolves by a mechanism similar to the Stransk-Krastanov mechan
ism. (C) 1997 American Institute of Physics.