Impedance measurements on TiO2-Fe2O3 thin films

Citation
Nv. Prasad et al., Impedance measurements on TiO2-Fe2O3 thin films, APPL PHYS A, 72(3), 2001, pp. 341-345
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
72
Issue
3
Year of publication
2001
Pages
341 - 345
Database
ISI
SICI code
0947-8396(200103)72:3<341:IMOTTF>2.0.ZU;2-Z
Abstract
TiO2-Fe2O3 semiconducting films were prepared by the resistive evaporation method on a glass substrate. Impedance and optical absorption measurements were made on these samples. From the impedance analysis (assuming an equiva lent RC circuit), it was observed that the admittance and impedance functio ns are frequency dependent. From the optical absorption spectrum, the energ y band-gap value was found to be 1.15 eV. The charge-carrier concentration (N) is calculated by using Mott-Schottky relations. I - V measurements were also made on these samples.