Quantum-confined Stark shift in electroreflectance of InAs/InxGa1-xAs self-assembled quantum dots

Citation
Tm. Hsu et al., Quantum-confined Stark shift in electroreflectance of InAs/InxGa1-xAs self-assembled quantum dots, APPL PHYS L, 78(12), 2001, pp. 1760-1762
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
12
Year of publication
2001
Pages
1760 - 1762
Database
ISI
SICI code
0003-6951(20010319)78:12<1760:QSSIEO>2.0.ZU;2-Y
Abstract
Electroreflectance was employed to study the electric-field effect on the i nterband transitions of InAs quantum dots embedded in an In0.16Ga0.84As mat rix. The electric field caused an asymmetric quantum-confined Stark shift, which revealed a nonzero built-in dipole moment in the quantum dots. We fou nd the ground-state and excited-state dipole moments to be in the same dire ction. The electron wave functions are distributed near the base of the qua ntum dot, with their centers located below the hole wave functions. We also observed a symmetric Stark shift in the wetting-layer transitions. This im plies that the wetting-layer potential is symmetric, despite its being capp ed with quantum dots. (C) 2001 American Institute of Physics.