An expanding thermal plasma for deposition of surface textured ZnO : Al with focus on thin film solar cell applications

Authors
Groenen, R Linden, JL van Lierop, HRM Schram, DC Kuypers, AD van de Sanden, MCM
Citation
R. Groenen et al., An expanding thermal plasma for deposition of surface textured ZnO : Al with focus on thin film solar cell applications, APPL SURF S, 173(1-2), 2001, pp. 40-43
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
173
Issue
1-2
Year of publication
2001
Pages
40 - 43
Database
ISI
SICI code
0169-4332(20010322)173:1-2<40:AETPFD>2.0.ZU;2-O
Abstract
A new method for low temperature deposition of surface textured ZnO:Al is p resented utilizing an expanding thermal plasma created by a cascaded are. F ilms are deposited at 200 degreesC at the rate of 0.65-0.75 nm s(-1) exhibi ting low resistivity (<10(-3) <Omega> cm), high visible transmittance (>80% ) and a rough surface texture. First application in p-i-n a-Si:H solar cell s indicates promising light trapping properties. (C) 2001 Elsevier Science B.V. All rights reserved.