Effect of thin oxide capping on interlayer coupling in spin valves

Citation
Ji. Hong et al., Effect of thin oxide capping on interlayer coupling in spin valves, IEEE MAGNET, 36(5), 2000, pp. 2629-2631
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON MAGNETICS
ISSN journal
00189464 → ACNP
Volume
36
Issue
5
Year of publication
2000
Part
1
Pages
2629 - 2631
Database
ISI
SICI code
0018-9464(200009)36:5<2629:EOTOCO>2.0.ZU;2-Y
Abstract
We controlled interlayer coupling from ferromagnetic to antiferromagnetic b y appropriately capping spin valves with thin oxides. The interlayer coupli ng field was -16.6 Oe at a Cu-spacer thickness of 30 Angstrom. The sign of coupling changed at a Cu-spacer thickness of 20 Angstrom. The antiferromagn etic coupling achieved in this way allowed a reduction of thickness of the Cu spacer down to 20 Angstrom without loss of good magnetic and electrical properties, and this led to a significant improvement in the MR response of the spin valves. The interlayer coupling field was only +8.6 Oe even at a Cu-spacer thickness of 20 Angstrom. We attribute the improvement in MR resp onse to less current shunting through the most conductive Cu layer and to e nhanced specular scattering at the interface between the free and the oxide capping layer.