Jr. Jeong et Sc. Shin, Dependence of magnetoelastic anisotropy on Ni-sublayer thickness in Ni/Pd nanomultilayers, IEEE MAGNET, 36(5), 2000, pp. 3229-3231
We have investigated the dependence of magnetoelastic anisotropy energy on
the Ni-sublayer thickness in Ni/Pd nanomultilayers to examine the contribut
ion of magnetoelastic anisotropy to perpendicular magnetic anisotropy (PMA)
observed in Ni/Pd nanomultilayers. Magnetoelastic anisotropy energy was qu
antitatively determined by delicate in situ stress and ex situ magnetostric
tion coefficient measurements, It was found that the magnetoelastic anisotr
opy for the samples prepared at 2-mTorr Ar sputtering pressure is largely d
ependent on the Ni-sublayer thickness: the magnetoelastic anisotropy is var
ied from 4.6 x 10(5) to -0.8 x 10(5) erg/cm(3). However the magnetoelastic
anisotropy for the samples prepared at 7 mTorr is nearly constant with vary
ing the Ni sublayer thickness: the magnetoelastic anisotropy of 3.5(+/-0.7)
x 10(5) erg/cm(3) is observed, irrespective of the Ni-sublayer thickness.