Quantum confinement effects on the optical properties of ion beam sputtered nickel oxide thin films

Authors
Krishna, MG Bhattacharya, AK
Citation
Mg. Krishna et Ak. Bhattacharya, Quantum confinement effects on the optical properties of ion beam sputtered nickel oxide thin films, INT J MOD B, 15(2), 2001, pp. 191-200
Citations number
33
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
INTERNATIONAL JOURNAL OF MODERN PHYSICS B
ISSN journal
02179792 → ACNP
Volume
15
Issue
2
Year of publication
2001
Pages
191 - 200
Database
ISI
SICI code
0217-9792(20010120)15:2<191:QCEOTO>2.0.ZU;2-9
Abstract
Quantum confinement effects on the optical properties of ion beam sputtered nickel oxide thin films are reported. Thin films with crystallite sizes in the range 9 to 14 nm have been deposited on to fused silica substrates. Th ere is an increase in band gap, from 3.4 to 3.9 eV, and a decrease in refra ctive index, from 2.4 to 1.8, with decrease in crystallite size, that can b e attributed to quantum confinement effects. The effective mass approximati on has been used to explain the observed behaviour in band gap variation.