Control of amorphous solid water morphology using molecular beams. II. Ballistic deposition simulations

Citation
Ga. Kimmel et al., Control of amorphous solid water morphology using molecular beams. II. Ballistic deposition simulations, J CHEM PHYS, 114(12), 2001, pp. 5295-5303
Citations number
18
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CHEMICAL PHYSICS
ISSN journal
00219606 → ACNP
Volume
114
Issue
12
Year of publication
2001
Pages
5295 - 5303
Database
ISI
SICI code
0021-9606(20010322)114:12<5295:COASWM>2.0.ZU;2-P
Abstract
Ballistic deposition simulations of thin film growth were performed. The re sults of the simulations are compared to experiments of N-2 adsorption by p orous amorphous solid water thin films. The simulations are in qualitative agreement with the experimental observations: The porosity of the thin film s is controlled by using a collimated beam to vapor deposit the films. Film s with normal or near normal growth angles (theta similar to0 degrees) are relatively dense and smooth. Films with larger growth angles are highly por ous and the average pore size increases as the growth angle increases. The simulations indicate that for growth angles greater than similar to 70 degr ees, adsorption into the largest pores is not possible leading to the exper imentally observed maximum in N-2 adsorption by porous amorphous solid wate r at theta = 70 degrees. (C) 2001 American Institute of Physics.