A Monte Carlo percolative approach to reliability analysis of semiconductor structures

We present a reliability analysis associated with the electrical degradatio n and failure of a thin-film due to the stochastic generation of defects dr iven by local Joule heating. To this purpose a combined Monte Carlo percola tive approach is used. The thin-film is modelled as a two-dimensional resis tor network and its degradation is characterized by a breaking probability of the single resistor related to the substrate temperature and to the loca l Joule heating. The dependence of the single resistor on the local tempera ture is taken into account. Furthermore, the introduction of a recovery of the damage, which hinders the irreversible degradation of the system by all owing a stationary state, is also discussed. (C) 2001 IMACS. Published by E lsevier Science B.V. All rights reserved.