We study the device characterization of Si-on-insulator (SOI) metal-oxide s
emiconductor field effect transistor (MOSFET) with buried Si1-xGex quantum
well (QW) channel. Accurate quantum mechanical description of the p-channel
of the buried Si1-xGex QW shows that the peak carrier concentration in the
conduction channel is higher in the positively graded SiGe QW, whereas the
carriers are more uniformly distributed in the retrograded QW. By phenomen
ologically introducing a physical parameter to describe the energy relaxati
on of transmitting wave due to various scattering processes, systematic sim
ulation about quantum wave transmissions of our SOI MOSFET indicates normal
current-bias characteristics at nanometre regime. A threshold gate bias of
about 0.6 V is obtained for both the positively graded and retrograded SiG
e QWs. (C) 2001 Elsevier Science B.V. All rights reserved.