Direct writing for three-dimensional microfabrication using synchrotron radiation etching

This paper presents rapid three-dimensional microfabrication technologies f or PTFE by direct writing with the TIEGA process, a LIGA-like process which replaces hard X-ray lithography with synchrotron radiation (SR) direct pho to-etching. The etching rates of this process are of the order of 6-100 mum min(-1), depending on the photon flux of the SR light. An X-ray lathe has been modified into an SR etching lathe to form cylindrical, helical, pyrami dal, ellipsoidal, and other nonplanar objects. A metallic wire covered with a PTFE sheet is rotated and/or moved while being irradiated with SR throug h a mask. Moreover, direct writing without using any masks has been develop ed, by combining a scanning stage with a high degree of freedom under He at mosphere, for creating any microstructure. The capabilities of these techno logies and initial fabrication results are described here. (C) 2001 Elsevie r Science B.V. All rights reserved.