Trends in void-free pre-metal CVD dielectrics

Authors
Vassiliev, VY Sudijono, JL Cuthbertson, A
Citation
Vy. Vassiliev et al., Trends in void-free pre-metal CVD dielectrics, SOL ST TECH, 44(3), 2001, pp. 129
Citations number
16
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
SOLID STATE TECHNOLOGY
ISSN journal
0038111X → ACNP
Volume
44
Issue
3
Year of publication
2001
Database
ISI
SICI code
0038-111X(200103)44:3<129:TIVPCD>2.0.ZU;2-5
Abstract
Prevention of voids in CVD dielectrics is an increasingly difficult challen ge as gap spacing decreases. A systematic review of the gap-fill capabiliti es of several CVD processes identifies trends and likely future directions.