A combined TEM and time-resolved optical reflectivity investigation into the excimer-laser crystallization of a-Si films

Citation
Fc. Voogt et R. Ishihara, A combined TEM and time-resolved optical reflectivity investigation into the excimer-laser crystallization of a-Si films, THIN SOL FI, 383(1-2), 2001, pp. 45-47
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
383
Issue
1-2
Year of publication
2001
Pages
45 - 47
Database
ISI
SICI code
0040-6090(20010215)383:1-2<45:ACTATO>2.0.ZU;2-O
Abstract
Results are presented of cross-sectional transmission-electron microscopy a nd optical reflectivity investigations into the excimer-laser annealing of a-Si films. It is found that, in the initial stages of the excimer pulse, e xplosive crystallization leads to small, columnar and defect-rich grains. W e discuss the evolution of this microstructure as the laser energy is slowl y increased up to and beyond the super-lateral growth regime. We argue that melting along grain boundaries and defects is a crucial step in obtaining large single-crystalline grains. (C) 2001 Elsevier Science B.V. All rights reserved.