Experimental and numerical analysis of surface melt dynamics in 200 ns-excimer laser crystallization of a-Si films on glass

Citation
E. Fogarassy et al., Experimental and numerical analysis of surface melt dynamics in 200 ns-excimer laser crystallization of a-Si films on glass, THIN SOL FI, 383(1-2), 2001, pp. 48-52
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
383
Issue
1-2
Year of publication
2001
Pages
48 - 52
Database
ISI
SICI code
0040-6090(20010215)383:1-2<48:EANAOS>2.0.ZU;2-M
Abstract
In this work, the surface melt dynamics of amorphous Si films on glass was investigated experimentally and numerically for long pulse duration (200 ns ) excimer laser crystallization. The melting threshold, melt duration, dept h of fusion and critical fluence corresponding to the SLG regime were chara cterized by time-resolved reflectivity measurements, scanning electron micr oscopy and Raman spectroscopy. The numerical analysis of the laser melting- solidification process, including the explosive recrystallization phenomeno n, was demonstrated to be consistent with the experimental results. (C) 200 1 Elsevier Science B.V. All rights reserved.