Transport properties of microcrystalline (muc-Si/H) and polycrystalline (p-
Si) silicon films are analyzed by time resolved microwave conductivity (TRM
C), diffusion-induced TRMC (DTRMC), and Hail measurements. The comparison o
f carrier mobilities in microcrystalline silicon determined by TRMC as well
as DTRMC shows that trapping in the disordered part of these films is not
the main limiting parameter for transport in microcrystalline silicon. Besi
des, it is demonstrated that TRMC measurements are not sensitive to barrier
s between the crystallites. Our measurements reveal that, contrary to the c
ase of p-Si, the influence of barriers in muc-Si/H can be neglected. Transp
ort in muc-Si/H is consequently mainly limited by defects inside the crysta
llites. (C) 2001 Elsevier Science B.V. All rights reserved.