Thin film microfabrication of gold microelectrodes functionalized with thiacalix[4]arene layer: applications to copper ion sensor

Authors
Ben Ali, M Lemiti, M Jaffrezic-Renault, N Martelet, C Chovelon, JM Ben Ouada, H
Citation
M. Ben Ali et al., Thin film microfabrication of gold microelectrodes functionalized with thiacalix[4]arene layer: applications to copper ion sensor, THIN SOL FI, 383(1-2), 2001, pp. 292-295
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
383
Issue
1-2
Year of publication
2001
Pages
292 - 295
Database
ISI
SICI code
0040-6090(20010215)383:1-2<292:TFMOGM>2.0.ZU;2-8
Abstract
Thin-film technology of the microelectrode was done using selected protecti ve photoresist combined with chemical/plasma etching. In order to functiona lize the prepared gold microelectrodes, a thin thiacalix[4]arene film was d eposited using a thermal evaporation technique in a vacuum. The thiacalix[4 ]arene/microelectrodes have shown good sensitivity and a low detection limi t (approx. 10(-7) M) for Cu(II) ions. (C) 2001 Elsevier Science B.V. All ri ghts reserved.