Dk. Dosev et al., Analysis of bias stress on thin-film transistors obtained by Hot-Wire Chemical Vapour Deposition, THIN SOL FI, 383(1-2), 2001, pp. 307-309
The stability under gate bias stress of unpassivated thin film transistors
was studied by measuring the transfer and output characteristics at differe
nt temperatures. The active layer of these devices consisted of in nanocrys
talline silicon deposited at 125 degreesC by Hot-Wire Chemical Vapour Depos
ition. The dependence of the subthreshold activation energy on gate bias fo
r different gate bias stresses is quite different from the one reported for
hydrogenated amorphous silicon. This behaviour has been related to trapped
charge in the active layer of the thin film transistor. (C) 2001 Elsevier
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