Cf. Lin et al., Electroluminescence at silicon band gap energy from mechanically pressed indium-tin-oxide/Si contact, APPL PHYS L, 78(13), 2001, pp. 1808-1810
Room temperature electroluminescence (EL) corresponding to Si band gap ener
gy is observed from mechanically pressed indium-tin-oxide (ITO)/Si contact.
The intensity of luminescence is pressure dependent and highly related to
the current-voltage characteristics. Increasing pressure simultaneously red
uces the rectification property and the luminescence. The physical reason f
or EL is attributed to the formation of an air gap between the ITO and the
Si substrate. The role of the air gap is similar to the oxide layer in the
metal-oxide-semiconductor structure. The influence of surface quality of th
e Si substrate on the luminescence spectrum is also studied, and found to b
e significant. (C) 2001 American Institute of Physics.