Electroluminescence at silicon band gap energy from mechanically pressed indium-tin-oxide/Si contact

Citation
Cf. Lin et al., Electroluminescence at silicon band gap energy from mechanically pressed indium-tin-oxide/Si contact, APPL PHYS L, 78(13), 2001, pp. 1808-1810
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
13
Year of publication
2001
Pages
1808 - 1810
Database
ISI
SICI code
0003-6951(20010326)78:13<1808:EASBGE>2.0.ZU;2-F
Abstract
Room temperature electroluminescence (EL) corresponding to Si band gap ener gy is observed from mechanically pressed indium-tin-oxide (ITO)/Si contact. The intensity of luminescence is pressure dependent and highly related to the current-voltage characteristics. Increasing pressure simultaneously red uces the rectification property and the luminescence. The physical reason f or EL is attributed to the formation of an air gap between the ITO and the Si substrate. The role of the air gap is similar to the oxide layer in the metal-oxide-semiconductor structure. The influence of surface quality of th e Si substrate on the luminescence spectrum is also studied, and found to b e significant. (C) 2001 American Institute of Physics.