High mobility in n-type GaN substrates

Citation
A. Saxler et al., High mobility in n-type GaN substrates, APPL PHYS L, 78(13), 2001, pp. 1873-1875
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
13
Year of publication
2001
Pages
1873 - 1875
Database
ISI
SICI code
0003-6951(20010326)78:13<1873:HMINGS>2.0.ZU;2-3
Abstract
High peak electron mobilities were observed in freestanding c-plane GaN lay ers. Two well-defined electrical layers, a low mobility degenerate interfac e layer, and a high mobility nondegenerate bulk layer, were present in thes e samples. The carrier concentrations and mobilities for the layers were ex tracted using two methods: (1) magnetic field dependent Hall effect analysi s; and (2) a simple two layer Hall model with the assumption that one of th e layers is degenerate. The electron Hall mobility of the bulk layer is fou nd to peak at nearly 8000 cm(2)/V s at low temperature using the magnetic f ield dependent Hall effect analysis. (C) 2001 American Institute of Physics .