Direct patterning of self-assembled nanocrystal monolayers by electron beams

We demonstrate a method for laterally patterning metal nanocrystal monolaye rs. Extended monolayers are first self-assembled onto a solid substrate. Di rect electron-beam exposure is then used to strip the dodecanethiol ligand coating from the nanocrystal cores, enabling the cores to stick to the unde rlying substrate. During a subsequent washing step in a solvent mixture, na nocrystals from the unexposed regions are removed and floated off, leaving behind the desired pattern. (C) 2001 American Institute of Physics.