We report a quantitative investigation of direct electron beam writing in m
onolayer films of passivated gold nanoclusters. In this process, the passiv
ating organic ligands are (partially) removed to create gold-based nanostru
ctures. We report the fabrication of lines with width as narrow as 26 nm, w
hile measurements of the linewidth as a function of dose allow us to obtain
a quantitative measure of the sensitivity, for comparison with established
negative tone resists. (C) 2001 American Institute of Physics.