Effect of alcohol-based sulfur treatment on Pt Ohmic contacts to p-type GaN

Citation
C. Huh et al., Effect of alcohol-based sulfur treatment on Pt Ohmic contacts to p-type GaN, APPL PHYS L, 78(13), 2001, pp. 1942-1944
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
13
Year of publication
2001
Pages
1942 - 1944
Database
ISI
SICI code
0003-6951(20010326)78:13<1942:EOASTO>2.0.ZU;2-1
Abstract
The effects of an alcohol-based (NH4)(2)S solution [t-C4H9OH+(NH4)(2)S] tre atment on Pt Ohmic contacts to p-type GaN are presented. The specific conta ct resistance decreased by three orders of magnitude from 2.56x10(-2) to 4. 71x10(-5) Omega cm(2) as a result of surface treatment using an alcohol-bas ed (NH4)(2)S solution compared to that of the untreated sample. The O 1s an d Pt 4f core-level peaks in the x-ray photoemission spectra showed that the alcohol-based (NH4)(2)S treatment was effective in removing of the surface oxide layer. Compared to the untreated sample, the alcohol-based (NH4)(2)S -treated sample showed a Ga 2p core-level peak which was shifted toward the valence-band edge by 0.25 eV, indicating that the surface Fermi level was shifted toward the valence-band edge. These results suggest that the surfac e barrier height for hole injection from Pt metal to p-type GaN can be lowe red by the surface treatment, thus resulting in a drastic reduction in spec ific contact resistance. (C) 2001 American Institute of Physics.