A new OMCVD iridium precursor for thin film deposition

Authors
Serp, P Feurer, R Kalck, P Gomes, H Faria, JL Figueiredo, JL
Citation
P. Serp et al., A new OMCVD iridium precursor for thin film deposition, CHEM VAPOR, 7(2), 2001, pp. 59-62
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMICAL VAPOR DEPOSITION
ISSN journal
09481907 → ACNP
Volume
7
Issue
2
Year of publication
2001
Pages
59 - 62
Database
ISI
SICI code
0948-1907(200103)7:2<59:ANOIPF>2.0.ZU;2-S