Experimental characterization and modeling of pulsed MOCVD with ultrasonicatomization of liquid precursor

Layers of titania were deposited on nickel substrates by an innovative proc ess called pulsed MOCVD. Variation in growth rate, conversion efficiency, c rystallographic orientation, and microstructure were studied as functions o f precursor injection rate and deposition temperature. Pulsed-MOCVD was fou nd to provide a great deal of control of microstructure, optimization for h igh growth rates, and high conversion efficiency. A Langmuir derivation of mass balance on the growing film surface with a surface saturation conditio n was used to model the deposition.