N. Chaoui et al., Reflectivity of crystalline Ge and Si at the melting temperature measured in real time with subnanosecond temporal resolution, J APPL PHYS, 89(7), 2001, pp. 3763-3767
Real time reflectivity measurements with subnanosecond time resolution have
been used to determine the reflectivity at the melting temperature R-S(T-m
) of single crystalline Ge and Si at 514.5 nm. Due to the excellent time re
solution and sensitivity achieved in a single exposure experiment, the refl
ectivity of the solid just before melting could be measured. Values of R-S(
T-m)=0.470 +/-0.006 and R-S(T-m)=0.440 +/-0.008 for c-Ge and c-Si have, res
pectively, been determined. These values, together with those determined by
heating in vacuum in the range 300-800 K, are compared to those reported e
arlier in the literature and the differences are discussed. (C) 2001 Americ
an Institute of Physics.