Current transport in ramp-type junctions with engineered interface

Citation
Jk. Heinsohn et al., Current transport in ramp-type junctions with engineered interface, J APPL PHYS, 89(7), 2001, pp. 3852-3860
Citations number
30
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
7
Year of publication
2001
Pages
3852 - 3860
Database
ISI
SICI code
0021-8979(20010407)89:7<3852:CTIRJW>2.0.ZU;2-A
Abstract
The transport properties of "interface-engineered" edge-type YBa2Cu3O7 Jose phson junctions are investigated in detail. We have investigated the depend ence of the current-voltage characteristics on external magnetic field, tem perature, and microwave irradiation and compare them to the resistively shu nted junction model. The temperature dependence of the critical current and the normal resistance allows us to draw conclusions to the transport of qu asiparticles and Cooper pairs in the investigated "interface-engineered" ju nctions. We have studied the properties of junctions for which La doped YBa 2Cu3O7 is used for the superconducting electrodes. We will propose a model for the undoped and the La doped case which takes into account a barrier wh ich consists of a series connection of a normal conducting layer and an ins ulator, containing superconducting microconstrictions. (C) 2001 American In stitute of Physics.