1/f noise in metal-oxide-semiconductor transistors biased in weak inversion

Citation
J. Rhayem et al., 1/f noise in metal-oxide-semiconductor transistors biased in weak inversion, J APPL PHYS, 89(7), 2001, pp. 4192-4194
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
7
Year of publication
2001
Pages
4192 - 4194
Database
ISI
SICI code
0021-8979(20010407)89:7<4192:1NIMTB>2.0.ZU;2-P
Abstract
An approach to model 1/f noise in the weak inversion range of metal-oxide-s emiconductor transistors (MOST) is proposed, based on Hooge's theory (mobil ity fluctuation model). Starting from conduction equations in the subthresh old regime, a method to evaluate the total number of carriers under the gat e is presented and allows us to deduce the Hooge parameter alpha (H). This model is applied to p-channel MOSTs. With the proposed model, the value of alpha (H) obtained in weak inversion is quite similar to this extracted in strong inversion allowing a unique description of the 1/f noise. (C) 2001 A merican Institute of Physics.