Jl. Fang et al., Studies on plasma polymerization of hexamethyldisiloxane in the presence of different carrier gases, J APPL POLY, 80(9), 2001, pp. 1434-1438
Plasma polymerization of hexamethyldisiloxane(HMDSO) in the presence of dif
ferent carrier gases such as H-2, He, N-2, Ar, and O-2 was carried out usin
g an inductively coupled electrodeless glow discharge. The polymerization k
inetics showed that the monomer HMDSO plasma-polymerized at different rates
from low to high for the carrier gases H-2, He, N-2, Ar, and O-2 in that o
rder. The products were studied using FTIR, electron spectroscopy for chemi
cal analysis, and elemental analysis. The results indicated that HMDSO mole
cules underwent different degrees of fragmentation in plasma polymerization
for different carrier gases and radio frequency (RF) powers. The polymer d
eposition rate and the structures of products were mainly dependent on mole
cular fragmentation, which varied with carrier gas and imposed RF power. O-
2 and H-2 gases can incorporate in the plasma polymers to form products con
taining more oxygen or hydrogen components, while other gases such as N-2 h
ave no detectable component in products. (C) 2001 John Wiley & Sons, Inc.