Chemical erosion of boronized films from DIII-D tiles

Citation
Jw. Davis et al., Chemical erosion of boronized films from DIII-D tiles, J NUCL MAT, 290, 2001, pp. 66-70
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Nuclear Emgineering
Journal title
JOURNAL OF NUCLEAR MATERIALS
ISSN journal
00223115 → ACNP
Volume
290
Year of publication
2001
Pages
66 - 70
Database
ISI
SICI code
0022-3115(200103)290:<66:CEOBFF>2.0.ZU;2-N
Abstract
Tile specimens from the DIII-D tokamak have been studied to determine their erosion characteristics when exposed to D+ ions and O-2 gas. Here, we repo rt results for tile surfaces from the outer midplane. Surface analyses (EDX , XPS, SIMS) indicate that the surface layer is composed primarily of boron , with an overlayer of a B/C mixture. Total hydrocarbon (SigmaC(i)D(j)) ero sion yields were initially found to be similar to0.01-0.02 C/D+, with limit ed variations due to D+ energy (50 or 200 eV) or specimen temperature (300- 700 K). Erosion yields were seen to decrease with fluence by a factor of 1. 5-2 over the range similar to4 X 10(21)-3 X 10(22) D+/m(2). Above similar t o3 X 10(22) D+/m(2) the yields level off. The initial erosion yields are fo und to be consistent with those for boron-doped graphite. O-2 gas exposure at 523 or 623 K initially removed similar to 25% of the trapped D; however, the remaining D could not be removed by baking in O-2 at temperatures up t o 623 K. (C) 2001 Elsevier Science B.V. All rights reserved.