Surface reactions of hydrocarbon radicals: suppression of the re-deposition in fusion experiments via a divertor liner

Citation
A. Von Keudell et al., Surface reactions of hydrocarbon radicals: suppression of the re-deposition in fusion experiments via a divertor liner, J NUCL MAT, 290, 2001, pp. 231-237
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Nuclear Emgineering
Journal title
JOURNAL OF NUCLEAR MATERIALS
ISSN journal
00223115 → ACNP
Volume
290
Year of publication
2001
Pages
231 - 237
Database
ISI
SICI code
0022-3115(200103)290:<231:SROHRS>2.0.ZU;2-Y
Abstract
The formation of re-deposited layers consisting of hydrocarbon compounds is of major concern for the development of next-step devices, because the hyd rogen bound in these layers contributes to tritium retention in a future fu sion reactor. This film formation might be controlled by using a liner in t he divertor pump duct to trap or transform neutral growth precursors before they deposit in remote areas of the vacuum vessel. For the understanding o f film formation in such a liner the knowledge of sticking coefficients of the growth precursors is mandatory. Therefore, experiments based on the cav ity technique were performed to measure surface loss probabilities of hydro carbon radicals. In addition sticking coefficients of methyl radicals were measured directly applying well-characterized quantified radical beams. To simulate film formation in a liner, a test experiment was performed consist ing of a stainless steel tube, which was exposed to a low-temperature plasm a from acetylene. The Variation of the film thickness along the inner surfa ce of this tube after plasma exposure can be described by a flux comprising of different neutral hydrocarbon radical species using the previously dete rmined sticking coefficients. Suggestions for the control of the formation of re-deposited layers are made and a possible design of such a divertor li ner is discussed. (C) 2001 Elsevier Science B.V. All rights reserved.