Molecular modeling of covalently attached alkyl monolayers an the hydrogen-terminated Si(111) surface

Citation
Ab. Sieval et al., Molecular modeling of covalently attached alkyl monolayers an the hydrogen-terminated Si(111) surface, LANGMUIR, 17(7), 2001, pp. 2172-2181
Citations number
38
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
LANGMUIR
ISSN journal
07437463 → ACNP
Volume
17
Issue
7
Year of publication
2001
Pages
2172 - 2181
Database
ISI
SICI code
0743-7463(20010403)17:7<2172:MMOCAA>2.0.ZU;2-S
Abstract
The structure of octadecyl monolayers on the H-terminated Si(111) surface i s investigated by molecular modeling simulations, using substitution percen tages from 33.3% to 100% of the Si-H moieties by Sialkyl groups. In all cal culations, two-dimensionally repeating boxes were used to mimic the modifie d surface. Calculations without this repeating box approach were shown to b e unsuccessful. The results on the repeating boxes showed that only with a substitution percentage of similar to 50% is there a good correlation betwe en the structure of the monolayers as obtained from molecular modeling and the available experimental data. A variety of substitution patterns with a substitution percentage of 50% on the Si(111) surface were investigated, wh ich showed that a zigzag-type pattern is most suitable to describe the stru cture of the layers. From the results of the investigations, an important c onclusion for future experimental work is drawn. It is shown that the exper imentally determined substitution percentage of 50-55% of the Si-H for Si-a lkyl groups is close to the maximum value that can be reached on the H-term inated Si(111) surface.