TiO2 thin films were obtained on unheated glass substrates by a DC reactive
magnetron sputtering method. The as-deposited films exhibit an amorphous s
tructure as observed from X-ray diffraction (XRD) patterns. The structure c
hanges to a mixed one of 70% anatase and 30% rutile after heat treatment in
air in the temperature range 293-673 K. Using ellipsometric measurements,
and a computer to solve the corresponding equations, a modeling technique w
as used to find the optical constants of the studied thin films. A sensitiv
ity analysis was performed. (C) 2001 Elsevier Science Ltd. All rights reser
ved.