Probe of the vicinal Si (111) surface by second harmonic phase spectroscopy

Citation
D. Schuhmacher et al., Probe of the vicinal Si (111) surface by second harmonic phase spectroscopy, MAT SC S PR, 4(1-3), 2001, pp. 51-53
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
ISSN journal
13698001 → ACNP
Volume
4
Issue
1-3
Year of publication
2001
Pages
51 - 53
Database
ISI
SICI code
1369-8001(200102/06)4:1-3<51:POTVS(>2.0.ZU;2-6
Abstract
The intrinsic surface sensitive technique of optical second harmonic (SH) p hase and intensity measurements is used to probe a slightly miscut natively oxidized Si(1 1 1) surface. The experiments have been performed in a spect ral interval covering the E-2 resonance of silicon band structure. The phas e and intensity of the SH wave measured at several azimuthal angular positi ons allow to separate the vicinal contributions. (C) 2001 Elsevier Science Ltd. All rights reserved.