The intrinsic surface sensitive technique of optical second harmonic (SH) p
hase and intensity measurements is used to probe a slightly miscut natively
oxidized Si(1 1 1) surface. The experiments have been performed in a spect
ral interval covering the E-2 resonance of silicon band structure. The phas
e and intensity of the SH wave measured at several azimuthal angular positi
ons allow to separate the vicinal contributions. (C) 2001 Elsevier Science
Ltd. All rights reserved.