Correlation between the microstructure and optical properties of carbon nitride films deposited by rf magnetron sputtering

Authors
Durand-Drouhin, O Lejeune, M Clin, M Henocque, J
Citation
O. Durand-drouhin et al., Correlation between the microstructure and optical properties of carbon nitride films deposited by rf magnetron sputtering, MAT SC S PR, 4(1-3), 2001, pp. 335-338
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
ISSN journal
13698001 → ACNP
Volume
4
Issue
1-3
Year of publication
2001
Pages
335 - 338
Database
ISI
SICI code
1369-8001(200102/06)4:1-3<335:CBTMAO>2.0.ZU;2-Z
Abstract
The microstructure and the optical properties of carbon nitride films have been investigated on films deposited by rf magnetron sputtering under diffe rent rf power between 15 and 350W applied to the graphite target, leading t o a negative target voltage range ca. -94 to -795 V. The results indicate a complex change in the microstructure, which is related to the optical prop erties. (C) 2001 Elsevier Science Ltd. All rights reserved.