Magnetoresistance of an insulating amorphous nickel-silicon film in large magnetic fields

Citation
R. Rosenbaum et al., Magnetoresistance of an insulating amorphous nickel-silicon film in large magnetic fields, PHYSICA B, 294, 2001, pp. 340-342
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA B
ISSN journal
09214526 → ACNP
Volume
294
Year of publication
2001
Pages
340 - 342
Database
ISI
SICI code
0921-4526(200101)294:<340:MOAIAN>2.0.ZU;2-B
Abstract
High magnetic field measurements for the magnetoresistance ratios R(B,T)/R( 0,T) have been made on an insulating amorphous nickel-silicon thin film. In zero field, the resistance of this insulating film exhibits a "soft gap" v ariable-range hopping law in the liquid helium temperature region. In small fields, negative magnetoresistance values are observed, which can be expla ined using the forward interference (orbital momentum) theory. In intermedi ate and large fields, the magnetoresistance is positive and large and can b e explained using the wave function shrinkage theory. A phenomenological mo del incorporating both processes gives very acceptable fits to the experime ntal data. (C) 2001 Elsevier Science B.V. All rights reserved.