Low-temperature CH4 total oxidation on catalysts based on high surface area SnO2

Authors
Citation
X. Wang et Yc. Xie, Low-temperature CH4 total oxidation on catalysts based on high surface area SnO2, REACT KIN C, 72(1), 2001, pp. 115-123
Citations number
22
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
REACTION KINETICS AND CATALYSIS LETTERS
ISSN journal
01331736 → ACNP
Volume
72
Issue
1
Year of publication
2001
Pages
115 - 123
Database
ISI
SICI code
0133-1736(200101)72:1<115:LCTOOC>2.0.ZU;2-P
Abstract
Pure SnO2, sulfated SnO2-SO42- and Pd supported on SnO2 and SnO2-SO42- were prepared from SnO2 precursor with high surface area, and used for CH4 deep oxidation. The catalysts were characterized by means of N-2-BET, XRD, TG-D TA, XPS and TPD. SnO2-SO42- shows higher activity than SnO2, due to the pre sence of more active oxygen species, superacid sites and its higher BET sur face area. Pd/SnO2 and Pd/SnO2-SO42- display essentially the same activity to each other, while it is much higher than the activity on SnO2 and SnO2-S O42-. The main reason is ascribed to the concerted action between Pd and th e supports.