XPS, Raman spectroscopy, X-ray diffraction, specular X-ray reflectivity, transmission electron microscopy and elastic recoil detection analysis of emissive carbon film characterization

For a better understanding of the physical and electronic properties of emi ssive carbon films, one of the best ways is to compare the results obtained with several surface and structural analysis techniques. In this article, different types of carbon film depositions for developing large flat panel displays by field emission displays are analysed and the results are correl ated with their emissivity. Pulse laser ablation films, high-temperature pl asma-enhanced chemical vapour deposition (PECVD) films and low-temperature PECVD films are characterized by XPS, Raman spectroscopy, X-ray diffraction (XRD), specular X-ray reflectivity, transmission electron microscopy (TEM) and elastic recoil detection analysis (ERDA). The analyses lead us to conc lude that the sp(2)/sp(3) ratio is not a crucial parameter for carbon film emissivity. Crystalline structure seems more important. The presence of gra phite grains is essential for good and uniform emission. Combination of XPS , TEM, XRD, Raman spectroscopy and ERDA is necessary for the study of carbo n film emission. Copyright (C) 2001 John Wiley & Sons, Ltd.