Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering

In this study, indium tin oxide (ITO) films were fabricated by r.f. reactiv e sputtering on glass substrates at room temperature. After the deposition process, the films were treated by oxygen and (30% H-2 + 70% N-2) gas mixtu re plasma, respectively. The effect of the plasma treatments on the electri cal and optical properties of ITO films was then investigated. It was found that such parameters as the period and number of the plasma treatment had a great influence on the optoelectronic properties of the films. The proper ty variation of the plasma treated films differed for the oxygen and the (3 0% H-2 + 70% N-2) gas mixtures. Some potential applications of plasma treat ed films are also discussed. (C) 2001 Elsevier Science B.V. All rights rese rved.