The growth of aligned AlN-nanocrystals in aluminium after nitrogen-ion implantation at 330 K

Citation
T. Reier et al., The growth of aligned AlN-nanocrystals in aluminium after nitrogen-ion implantation at 330 K, THIN SOL FI, 385(1-2), 2001, pp. 29-35
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
385
Issue
1-2
Year of publication
2001
Pages
29 - 35
Database
ISI
SICI code
0040-6090(20010402)385:1-2<29:TGOAAI>2.0.ZU;2-Z
Abstract
Ion implantation of N-2(+) at 100 keV into metallic Al has been used to nuc leate and grow nanocrystals of insulating AlN within the Al matrix. The AlN -nanocrystals are well aligned to the Al host lattice. With increasing N+ d ose, the formation of a homogeneous layer of AlN is observed. The diffusion and growth process proceeds at temperatures below 70 degreesC (essentially at ambient temperature) and is enabled by a strain-enhanced diffusion of N into Al. The AlN-nanocrystals form rapidly within metallic Al, but not wit hin the more stable Al2O3 phase. (C) 2001 Elsevier Science B.V. All rights reserved.