Al-C-N-O composite thin films have been synthesized by radio frequency reac
tive diode sputtering of an aluminum target in plasmas of N-2 + O-2 + CH, g
as mixtures. The chemical structure and composition of the films have been
investigated by means of infrared and X-ray photoelectron spectroscopy. The
results reveal the formation of C-N, Al-C, Al-N and Al-O bonds. The X-ray
diffraction pattern suggests that the films are of nanometer composite mate
rial and contain predominately crystalline grains of hexagonal AlN and alph
a -Al2O3. A good thermal stability of the composite has been confirmed by t
he annealing treatment at temperatures up to 600 degreesC. (C) 2001 Elsevie
r Science B.V. All rights reserved.